光電半導部
    部門簡介
    產品簡介
    聯系我們
 
  相關鏈接
 
 
 
 高純度金屬 - 鎵 High Purity > 99.9999%
用於晶圓參雜製程及磊晶, 我們亦可以為客戶提供針對機台需求的各式規格 (ex: 罐狀 or 塊狀…etc.), 其成分請參考附件
 
Element
Result(ppb)
Element
Result(ppb)
Element
Result(ppb)
Li
0.2
Cr
0.4
In
1
Be
0.2
Mn
0.2
Sn
5
B
0.6
Fe
1.5
Sb
1
Na
0.3
Co
0.1
Te
1.5
Mg
0.2
Ni
0.3
Ba
3
Al
0.3
Cu
1
La
0.5
Si
1.5
Zn
1.5
W
0.6
P
0.5
Ge
25
Pt
1
S
1.8
As
2
Au
5
Cl
2
Se
6
Hg
5
K
5
Sr
2
Tl
0.5
Ca
8
Zr
0.5
Pb
0.8
Sc
0.06
Mo
0.7
Bi
1
Ti
0.1
Ag
50
Th
0.1
V
0.08
Cd
7
U
0.1
 高純度金屬 - 銀 High Purity > 99.99%                                      
用於半導體薄膜製程, 我們亦可以為客戶提供針對機台需求的各式規格 (ex: slug or target…etc.), 其成分請參考附件
 
Element
Result(ppm)
Element
Result(ppm)
Al
3
Mo
3
As
3
Ni
2.5
Bi
6
Pb
6.5
Cd
3
Pd
10
Cr
3.5
Sb
6
Cu
25
Sn
2.5
Fe
4
Zn
2.5
Mn
4
 高純度金屬 - 鎳 High Purity > 99.995%                                    
用於半導體薄膜製程, 我們亦可以為客戶提供針對機台需求的各式規格 (ex: slug or target…etc.), 其成分請參考附件
 
Element
Result(ppm)
Al
<10
Cr
<6
Cu
<12
Fe
<11
Si
<2
 高純度金屬 - 鋁 High Purity > 99.999%                                    
用於半導體薄膜製程, 我們亦可以為客戶提供針對機台需求的各式規格 (ex: slug or target…etc.), 其成分請參考附件
 
Element
Result(ppm)
Element
Result(ppm)
Cu
<0.5
Si
<0.4
Fe
<0.6
Ti
<0.3
Ga
<0.4
V
<0.6
Mg
<0.6
Zn
<0.6
Mn
<0.3
   
 高純度金屬 - 鈦 High Purity > 99.995%                                    
用於半導體薄膜製程, 我們亦可以為客戶提供針對機台需求的各式規格 (ex: slug or target…etc.), 其成分請參考附件
 
Element
Result(ppm)
Element
Result(ppm)
Al
3.5
Nb
< 2
Ca
<1
Ni
5.4
Cd
<1
Si
4.2
Cr
5.5
V
2.1
Fe
8.7
Zr
5
Hg
< 1
   
 磷化鎵基板 GaP wafer                                                                           
用於生產光電半導體 LED 基板, 請參考簡介規格
 
Inspection Certificate on Gallium Phosphide
Type  
Dopant S 
Orientation (111) +/- 0.5° 
  TOP BOTTOM
Carrier  
Concentration (1/cm-3)
3.75 x 1017 5.94 x 1017
Hall Mobility (cm2/V.sec.) 123 120
Dislocation Density (1/cm2) 1.67 x 105
1.88 x 105
Diameter 49.0 ~ 53.0 mm  
Thickness 285 +/- 15 um  
 砷化鎵基板 GaAs wafer                                                                         
用於生產光電半導體 LED 基板, 請參考簡介規格
各種不同長晶方式比較表  
 
VGF
LEC
HB
Wafer Size
2"~6"
3"~6"
~2.5"
Etch Density
Very low
High
Low
Residual Strain
Very low
High
Low
Carbon Control
Good
Good
 -
Stoichiometry / EL2 Control
Good
Moderate
Poor
砷化鎵基板規格表 (Semi-conducting & Semi-Insulating)       
 
Semi-conducting GaAs wafers
Parameter Unit
Diameter
2" 3" 100mm
Growth Method   VGF VGF VGF
Dopant   Si Si Si
Conductivity type   N N N
Carrier Concentration /cm3 (0.1~4) x 1018 (0.1~4) x 1018 (0.1~4) x 1018
Resistivity Ω-cm (15~1) x 10-3 (15~1) x 10-3 (15~1) x 10-3
Mobility cm2/Vs (3.5~1.5) x 103 (3.5~1.5) x 103 (3.5~1.5) x 103
Etch Pit Density /cm2 <500 <500 <500
Diameter mm 50.8 +/- 0.5 76.2 +/- 0.5 100 +/- 0.5
Thickness um (240~400) +/- 25 (300~625) +/- 25 625 +/- 25
Orientation   (100) +/- 0.5° (100) +/- 0.5° (100) +/- 0.5°
Off Orientation  
Upon Request
Major flat length mm 16 +/- 15 22.2 +/- 1.5 32 +/- 1.5
Minor flat length mm 7 +/- 1.5 11.2 +/- 1.5 18 +/- 1.5
TTV um 5 5 5
TIR um 5 5 5
Bow um 5 5 5
Warp um 5 5 5
Polished surface  
P/P, P/E, As-cut

Semi-Insulating GaAs wafers
Parameter Unit
Diameter
2" 3" 100mm
Growth Method   VGF VGF VGF
Dopant   C or Undoped C or Undoped C or Undoped
Carrier Concentration /cm3 N/A N/A N/A
Resistivity Ω-cm >1 x 107 >1 x 107 >1 x 107
Mobility cm2/Vs >6000 >6000 >6000
Etch Pit Density /cm2 <5000 <5000 <5000
Diameter mm 50.8 +/- 0.5 76.2 +/- 0.5 100 +/- 0.5
Thickness um (300~450) +/- 25 (350~625) +/- 25 625 +/- 25
Orientation   (100) +/- 0.5° (100) +/- 0.5° (100) +/- 0.5°
Off Orientation  
Upon Request
Major flat length mm 16 +/- 15 22.2 +/- 1.5 32 +/- 1.5
Minor flat length mm 7 +/- 1.5 11.2 +/- 1.5 18 +/- 1.5
TTV um 3 4 4
TIR um 3 4 4
Bow um 2 3 3
Warp um 4 3 3
Polished surface  
P/P, P/E, As-cut
 氧化鋁 (藍寶石) 基板 Al2O3 wafer                                              
 
Material Al2O3
Diameter 50.8 +/- 0.25 mm
Thickness 330 +/- 25 um
430 +/- 25 um
Orientation C-axis (0001) +/- 0.3°
Orientation Flat A-axis (1120) +/- 0.5°
Surface Epi-Ready Polished
TTV < 10 um
BOW 10 um
 金線 Bonding Wire                                                                        
用於 IC 晶片封裝 及 腳架連接金線, 我們針對客戶的使用要求提供各種規格, 請參考目錄
 
DIA Property at Room Temp

Property at High Temp

MIL um Breaking Load(gr)

Elongation(%)

Breaking Load(gr)

Elongation(%)

0.8

20.0

4.0~8.0

2.0~6.0

2 Min

0.5 Min

6.0~10.0

2.0~7.0

4 Min

0.5 Min

6.0~10.0

3.0~7.0

4 Min

0.5 Min

7.0~11.0

2.0~7.0

5 Min

0.5 Min

6.0~10.0

3.0~7.0

5 Min

0.5 Min

6.0~10.0

3.0~7.0

5 Min

0.5 Min

0.9

23.0

5.0~10.0

2.0~6.0

3 Min

0.5 Min

7.0~11.0

3.0~7.0

5 Min

0.5 Min

7.0~11.0

3.0~7.0

5 Min

0.5 Min

7.0~12.0

2.0~7.0

6 Min

0.5 Min

8.0~11.0

3.0~7.0

6 Min

0.5 Min

8.0~11.0

3.0~7.0

6 Min

0.5 Min

1.0

25.0

8.0~12.0

2.0~6.0

4 Min

0.5 Min

9.0~13.0

3.0~8.0

6 Min

0.5 Min

9.0~13.0

3.0~8.0

6 Min

0.5 Min

10.0~15.0

3.0~8.0

8 Min

0.5 Min

10.0~14.0

3.0~8.0

8 Min

0.5 Min

10.0~14.0

3.0~8.0

8 Min

0.5 Min

1.2

30.0

12.0~16.0

3.0~8.0

6 Min

0.5 Min

14.0~18.0

4.0~10.0

8 Min

0.5 Min

14.0~18.0

4.0~10.0

8 Min

0.5 Min

15.0~19.0

3.0~9.0

13 Min

0.5 Min

15.0~19.0

3.0~10.0

13 Min

0.5 Min

15.0~19.0

3.0~10.0

12 Min

0.5 Min

1.3

33.0

14.0~19.0

3.0~8.0

7 Min

1.0 Min

15.0~21.0

4.0~11.0

10 Min

1.0 Min

15.0~22.0

4.0~11.0

10 Min

1.0 Min

18.0~28.0

3.0~10.0

15 Min

1.0 Min

18.0~26.0

4.0~11.0

13 Min

1.0 Min

18.0~26.0

4.0~11.0

13 Min

1.0 Min

1.5

38.0

18.0~28.0

3.0~10.0

9 Min

1.0 Min

20.0~30.0

5.0~11.0

12Min

1.0 Min

20.0~30.0

5.0~11.0

12 Min

1.0 Min

25.0~35.0

4.0~10.0

18 Min

1.0 Min

24.0~35.0

5.0~11.0

15 Min

1.0 Min

24.0~35.0

5.0~11.0

15 Min

1.0 Min

2.0

50.0

30.0~45.0

3.0~12.0

 -

 -

35.0~45.0

6.0~15.0

24 Min

1.0 Min

35.0~47.0

6.0~15.0

24 Min

1.0 Min

40.0~52.0

5.0~15.0

 -

 -

40.0~50.0

5.0~15.0

 -

 -

40.0~50.0

5.0~15.0

 -

 -

Besides the above specifications, we are available to supply other types, upon customer's request.
Copyright (C)1996-2005 Gredmann Group.- All rights reserved.